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3 Day Course Description (Mahwah, NJ)
To further your education on Micro-XRF and to get the most out of your Orbis system, EDAX offers a training course twice a year. The course is specifically for Orbis users and covers the theory and physics of EDXRF, production and properties of XRF and effect of capillary optics on the primary tube radiation. Specific software topics include Qualitative and Quantitative analysis, fundamental parameters and intensity analysis. Imaging, mapping and linescan are also addressed. The course utilizes informative lectures along with hands on lab and computer demos and customer sample analysis. Select to register on line .
Training time is from 9:00 AM to 4:45 PM.
EDXRF Training Course Agenda
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Tuesday Morning
Welcome and introduction to EDAX
Lecture - Production & properties of XRF
•Quantum aspects of X-radiation
•The X-ray tube and its spectrum
•Continuum & characteristic radiation
•Effect of capillary optics on primary tube radiation
•Line excitation using primary X-ray
Lab session 1 - The µ-EDXRF system
Effect of tube parameters & primary optics
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Tuesday Afternoon
Lecture 2 Production & properties of X-ray
•Absorption & matrix effects
•Depth of analysis
•Scatter & diffraction
•Detection & energy spectra
•Artifact peaks in EDXRF
Lab session 2 - Qualitative analysis & identification of artifacts
Overview of Vision software
Discussion & close
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Wednesday Morning
Lecture 3 - Quantitative analysis
•Intensity modes
•Empirical & Fundamental Parameter models
Lab session 3 - Using the quantification packages
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Wednesday Afternoon
Lecture Aspects of mapping
Lab session 4 - ROI, spectrum and stage table
Discussion & close
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Thursday Morning
Lecture Aspects of line scanning
Lab session 5 - Aspects of line scanning
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Thursday Afternoon
Open forum Participants' samples
Closing Feedback from course participants
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Notes:
During the morning & afternoon sessions there will be a 15-minute break.
Please note that the order devoted to the above topics may vary considerably depending upon the course participant's requirements.
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