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![]() Orbis Silicon Drift Detector (SDD) Analyzer
The standard Orbis analyzer is ideal for applications that require large-particle or large feature analysis. This would include criminal forensics or industrial quality control work. The instrument has an industry-leading LN-Free X-ray silicon drift detector (SDD) and a color video camera with 10x and 100x magnification. A 300 µm mono-capillary lens, primary beam filter system and standard-precision motorized XYZ stage, and Genesis DPP analyzer are also included.
Standard Orbis SDD components include:
- Rh tube (50kV, 50 W)
- 300 µm mon-ocapillary optic
- Automated primary beam filter system (open position, 6 filters, shutter)
- Dual CCD cameras: 10x color; 100x color
- Advanced 30 mm2 Silicon Drift Detector (SDD). No liquid cryogen cooling required
- Standard precision, computer-controlled XYZ stage
- Sample chamber: vacuum or air
- Digial signal analyzer electronics
- Operating SW with automated analysis and quantification routines including:
- Fundamental Parameter analysis with or without standards
- Trace element analysis in light element matrices using Fundamental Parameter analysis
- Semi-empirical analysis using calibrations with standards
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The Orbis design eliminates incorrect sample analysis that occurs when sample topography obstructs the X-ray beam. |
Options:
- Sample chamber viewport with 4.9" x 4.9" (124 mm x 124 mm) viewable area
- Advanced 50 mm2 Silicon Drift Detector (SDD)
- Large area SiLi detectors are available for this model where appropriate for customer applications
- Mo tube (50kV, 50W)
- 100 µm mono-capillary optic in lieu of 300 µm mono-capillary optic
- Automated collimators (1 mm and 2 mm) in conjunction with mono-capillary optic; selectable by SW control
- Software: spectral mapping, image processing SW, linescan, coating analysis, spectral matching, alloy ID, remote spectrometer SW for data processing
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Orbis Micro-XRF Elemental Analyzer Bulletin
Orbis Micro-XRF System Brochure
Orbis Coating Software
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